Germanium as a scalable sacrificial layer for nanoscale protein patterning
نویسندگان
چکیده
منابع مشابه
Rapid Sacrificial Germanium Etching Using Xenon Difluoride
We present a novel micromachining procedure employing the noble gas halide, xenon difluoride (XeF2), to rapidly undercut a sacrificial layer comprised of low-temperature deposited amorphous germanium (α-Ge). As a proof of concept, this process is utilized to fabricate electrostatically-actuated suspended Bragg mirrors applicable to wavelength-tunable surface-normal photonic devices. Exploiting ...
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ژورنال
عنوان ژورنال: PLOS ONE
سال: 2018
ISSN: 1932-6203
DOI: 10.1371/journal.pone.0195062